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12/09/2009 - 12/09/2009 | Dresden

Workshop "He-Ion Microscopy and ist Applications"

During this workshop, scientists from both CARL ZEISS SMT and users / customers from research institutes will give insights into the current state of "He ion microscopy" based on the ORION microscope and provide examples for exciting application areas addressed so far.

The rapidly increasing use of advanced materials like carbon, ceramics as well as bio- and soft materials in nanotechnology cause numerous challenges for material characterization and -analysis.
Helium Ion Microscopy is showing a strong ability to address such challenges due to its high resolution imaging down to 2.5 Å combined with unique surface sensitivity. It also prevents surface damage of soft materials and allows a very efficient charge control. Life science research increasingly calls for nanometer resolution imaging on highly insulating samples of low weight materials, which can be addressed via the charge control capabilities of the tool. The extreme surface sensitivity provides the opportunity for high spatial resolution surface analysis and metrology with backscattered ion spectroscopy having monolayer sensitivity. Thin film and small particle analyses are two applications. By controlling the beam parameters it is possible to use the device for controlled and very gentle nano-machining especially for soft materials like graphene or biomaterials. Patterning with length scales of just a few nanometers and very high aspect ratios could be demonstrated. The lack of proximity effects makes the technology also interesting for applications in the area of photonic crystals.
Over the last year CARL ZEISS SMT has seen a rapid ramp of the installed base to now eleven systems outside the factory worldwide. The developers are working closely with most of these customers in specific application areas of the technology. During this workshop, scientists from both CARL ZEISS SMT and users / customers from research institutes will give insights into the current state of the art of technology and provide examples for exciting application areas addressed so far.

Workshop Topics:

- ORION He-Ion Microscope - A New Tool for High-Resolution Material Analysis
- Application of He-Ion Microscopy for nanomaterials studies with respect to imaging, backscattering analysis and lithography

Chairman:

Prof. W. Möller, Forschungszentrum Dresden-Rossendorf, Germany
Dr. Rainer Knippelmeyer, CARL ZEISS SMT Inc., Peabody, USA

Information on participating / attending:
Registration until 27.11.2009 at www.fzd.de/FWI/HeMi
The workshop is free of charge.
Travelling costs have to be covered by the participants.
Buffet and refreshments will be provided by FZD.

Date:

12/09/2009 10:30 - 12/09/2009

Registration deadline:

11/27/2009

Event venue:

Forschungszentrum Dresden-Rossendorf e.V.
Bautzner Landstraße 400
Institute Ion Beam Physics and Materials Research at FZD, building 7
01328 Dresden
Sachsen
Germany

Target group:

Scientists and scholars

Email address:

Relevance:

international

Subject areas:

Physics / astronomy

Types of events:

Entry:

11/05/2009

Sender/author:

Dr. Christine Bohnet

Department:

Öffentlichkeitsarbeit

Event is free:

no

Language of the text:

English

URL of this event: http://idw-online.de/en/event29366


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