a) Nanopartikellithographie zur Herstellung poröser Sensorelektroden: Nach Abscheidung einer Metallisierungs- und einer Isolatorschicht werden Mikro- oder Nanopartikel aufgebracht, die im zweiten Metallisierungsschritt als Schattenmasken dienen. Danach werden sie entfernt und mittels Plasmaätzen Poren in die Isolationsschicht eingebracht. b) Wafer mit Sensorchips. c) einzelner Sensorspot. d) REM Aufnahme einer Querschnittspräparation des Schichtsystems mit Poren.
Source: NMI
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