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Nachrichten, Termine, Experten
Nachrichten, Termine, Experten
Leibniz-Institut für Kristallzüchtung and Oxide Corporation, a Japanese company specializing in the research and manufacturing of single crystals and laser devices, have entered a joint research and development concerning the technology transfer of advanced single crystalline materials for laser applications.
Oxide Corporation is a spin-off venture company from National Institute for Materials Science (NIMS) founded in 2000. Since its foundation, Oxide has aimed to be a global niche top company in single crystals and lasers, and has been actively engaged in social implementation of research results obtained not only in its own research but also at university research institutes in Japan and abroad.
The Leibniz-Institut für Kristallzüchtung (IKZ) in Berlin-Adlershof is an international state-of-the-art competence center for science & technology as well as service & transfer for innovations in and by crystalline materials. The R&D spectrum thereby ranges from basic over applied research activities up to pre-industrial research tasks.
In today's industrial landscape, laser devices play an irreplaceable role across diverse sectors, from material processing in automotive manufacturing to critical inspection processes within the semiconductor industry. The escalating need for these devices has been a driving force behind continuous technological advancements, particularly in high-power lasers and coherent light sources with shorter wavelengths. At the heart of these laser innovations lie functional single crystals, pivotal in both generating and controlling laser beams. The performance and capabilities of the end product hinge significantly on the quality and properties of these crystalline materials. They serve as the fundamental backbone, dictating the efficacy and precision of laser technologies.
Given this background, Oxide and IKZ have officially entered into a technology transfer agreement wherein IKZ will transfer its cutting-edge technology on single crystalline materials for next-generation lasers to Oxide. The innovative technology established through extensive research at IKZ aims to overcome the performance limitations in lasers with higher power outputs and shorter wavelengths. The agreement reflects a mutual commitment between IKZ and Oxide to surmount these limitations, marking a pivotal breakthrough in laser technology. This collaboration sets the stage for further collaborative research and development initiatives focused on crystalline materials. Our collective aim is to seamlessly integrate these advancements into practical applications, fostering progress in the realms of lasers and optics, and in this way contributing meaningfully to societal development.
Dr. Hiroki Tanaka
Junior Research Group Leader Fluoride Crystals for Photonics
Bulk Crystals / Oxides & Fluorides
Phone: 0049 30 6392 2821
Email: hiroki.tanaka@ikz-berlin.de
Crystal growth station of the department "Oxides and Fluorides" at IKZ
Dr. Hiroki Tanaka
IKZ
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Crystal growth station of the department "Oxides and Fluorides" at IKZ
Dr. Hiroki Tanaka
IKZ
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